The PHEMOS-X is a high-resolution micro-luminescence microscope capable of locating failure sites by detecting faint light and heat emitted from semiconductor device defects.
● Two ultra-high sensitivity cameras can be installed
● Up to 7 OBIRCH, DALS, EOP, and laser marking light sources can be installed
● High precision stage designed specifically for advanced equipment
By covering different emission analysis and thermal analysis detection wavelength ranges, it is easy to choose analysis techniques that match the sample and fault mode.
The working range of the optical stage
| X | ±20 mm |
| Y | ±20 mm |
| Z | +80 mm |
The contrast enhancement function makes the image clearer and more delicate.
Display function
Comment: Comments, arrows, and other indicators can be displayed anywhere on the image as needed.
Scale display: The scale width can be displayed in segments on the image.
Grid display: Vertical and horizontal grid lines can be displayed on the image.
Thumbnail display: Images can be stored as thumbnails and called, and image information such as stage coordinates can be displayed.
Split screen display: It can display pattern images, low light images, overlay images, and reference images all at once on a 6-window screen.
| Size | Host: 1656 mm (W) × 2000 mm (H) × 1247 mm (D), approximately 1640 kg Console * 1:1000 mm (W) x 700 mm (H) x 800 mm (D), approximately 39.2 kg (C16216-01 console)/1480 mm (W) x 700 mm (H) x 800 mm (D), approximately 48.6 kg (C16216-02 console) |
| line voltage | Single phase 200 V~240 V |
| Power consumption | Approximately 3300 VA |
| Degree of vacuum | At least 80 kPa |
| Compressed air * 2 | 0.6 MPa ～ 0.7 MPa |
*1: Options
*2: Including regulators
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