The PHEMOS-X is a high-resolution micro-luminescence microscope capable of locating failure sites by detecting faint light and heat emitted from semiconductor device defects.

● Two ultra-high sensitivity cameras can be installed

● Up to 7 OBIRCH, DALS, EOP, and laser marking light sources can be installed

● High precision stage designed specifically for advanced equipment

iPHEMOS-MPX  is a high-resolution micro light microscope that can locate failure locations by detecting weak light and heat emitted by defects in semiconductor devices.

● Can install two ultra-high sensitivity cameras

● Up to 4 OBIRCH, DALS, EOP, and laser marking light sources can be installed

● Up to 4 OBIRCH, DALS, EOP, and laser marking light sources can be installed

● High precision stage designed specifically for advanced devices

Dual PHEMOS-X is designed specifically for advanced 3D non transparent devices, where optical fault analysis may need to be performed simultaneously on both sides (top and bottom) at the wafer or chip level.

● Analysis on both sides

● It is easy to switch between top fault analysis and bottom fault analysis without moving the device to another system/instrument.