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Dual PHEMOS-X

Dual PHEMOS-X is designed specifically for advanced 3D non transparent devices, where optical fault analysis may need to be performed simultaneously on both sides (top and bottom) at the wafer or chip level.

● Analysis on both sides

● It is easy to switch between top fault analysis and bottom fault analysis without moving the device to another system/instrument.

Advantages

Analysis on both sides

It is easy to switch between top fault analysis and bottom fault analysis without moving the device to another system/instrument.

High precision stage designed specifically for advanced equipment

The working range of the optical stage

 XYZ
Top40 mm40 mm80 mm
Bottom60 mm60 mm20 mm

*Due to the use of probe stations and interference from sample stations or NanoLens installations, the working range may be narrower than these values.


Sample stage (semi-automatic probe stage MPd-1000X C16688-01)

Main functions

• XY stage control
• Z. Theta Control

X300 mm
>Y300 mm
>Z22.5 mm
+/- 5°

• Wafer mapping function

• Alignment function


Basic display function

Overlay display/contrast enhancement function

s-phemos-x-pf4-xx.jpeg

Dual PHEMOS-X Overlay low light images onto high-resolution pattern images to quickly locate defect points.

The contrast enhancement function makes the image clearer and more delicate.

Display function

Comment: Comments, arrows, and other indicators can be displayed anywhere on the image as needed.

Scale display: The scale width can be displayed in segments on the image.

Grid display: Vertical and horizontal grid lines can be displayed on the image.

Thumbnail display: Images can be stored and accessed in the form of thumbnails. It can display image information such as platform coordinates.

Split screen display: It can display pattern images, low light images, overlay images, and reference images all at once on a 6-window screen.


Specifications
SizeHost: 1900 mm (W) × 2200 mm (H) × 1350 mm (D), approximately 2335 kg
System rack: 1060 mm (W) × 1841.5 mm (H) × 715 mm (D), approximately 370 kg
Probe stand frame: 800 mm (W) x 1800 mm (H) x 650 mm (D), approximately 360 kg
Line voltageSingle phase 200 V~AC 240 V 50 Hz/60 Hz
Power consumptionApproximately 3300 VA (system rack)/Approximately 4400 VA (probe station rack)
Degree of vacuum-40 kPa ~ -80 kPa
Compressed air0.5 MPa ~ 0.7 MPa

*1  Including regulators