

● Detection sensitivity Bright Field-0.42 μ m; Dard Field-0.3μm
● Multiple amplification to optimize sensitivity
● Can use detection algorithms based on different regions to optimize sensitivity
● Can import CAD design drawings, based on drawing detection
● Able to use different focuses, magnifications, light sources, sensitivities, and detection engines to run continuous scanning within one detection cycle
● Equipment Matching - Simple Formula Transmission from Device to Device
Leading 2D detection capability
• Algorithm provided submicron defect detection
• Can import CAD design drawings, based on drawing detection
• Clear visual light source for multi-layer RDL applications
• Internal Crack Detection (ICI) of Cut Chips
• Backlight lighting technology
Cutting-edge platform
• Customized optical components
• High intensity LED lighting
• Significantly increased production
| Inspection Capabilities | Various surface defects inspection of 1 pixel size for Bright Field and 0.5 pixel size for Dark Field |
| Resolution | Multiple magnifications for optimized sensitivity |
| Zone Editing | CAD based detection |
| CAD | Enables running successive scans in one cycle with different focus, magnification, illumination, sensitivity and detection enginea |
| Multi Recipe | Enables running successive scans in one cycle with different focus, magnification, illumination, sensitivity and detection engines |
| Defect Classification / Filtering | Feature based classification |
| Tool Matching | Simple recipe transfer from system to system System to System results matching |
| Bumptypes | Copperpillar,solder,goldbumps,microbumps |
| Capabilities | Measurementofbumpheight,co-planarity,PR/PI thicknessandviaopeningdepthandsurface-tosurfacemetrology |
| CTS‒CamtektriangulationSensor:Highspeed3Dscan | |
| HeightAccuracy① | 0.1μm |
| HeightRepeatability① | 1%ofbumpheightand>0.2μmat3σ |
| MeasurementRange | 2‒250μm |
| CCS-CamtekConfocalSensor:3Dhighresolutionprofileareamapping | |
| HeightRepeatability① | 0.1μmat3σ |
| LayerthicknessRange | 5-200μm |
| Heightmetrologyrange | 1μm-300μm |
| CLIP‒CamtekLightinterferometerprofiler: | |
| Resolution | 0.05μm |
| HeightRepeatability① | 0.2μmat3σ |
| MeasurementRange | 0.2-100μm |
| Object types | Bump, RDL, Pad, UBM, Via |
| Capabilities | Measurement of diameter, width, length, placement deviations, overlay, die shift |
| Accuracy | 0.1μm |
| Repeatability | 0.2μm at 3σ |
| Setup Online and Offline | User-defined detection parameters per defect type
and zone. Interactive automated routines for easy zone definition定义 |
| Job Portability & Tool Matching | Allows transfer of jobs between compatible models running on same SW version for system to system results matching匹配 |
| Review Options | Color Black & White IR |
| Smart Grab | Customized preset for defect type, count and location, minimizing grabbing and verification time, optimizing image quality to defect type |
| Offline Station | PC-based station for viewing and reclassification of defect images captured during scanning (monochrome) or post-scanning (color and/or monochrome) |
| Histograms | Distribution charts of all defect and metrology data |
| Reports | SPC analysis at lot, wafer and die level, KLARF |
| Wafer Maps | Generate, import, edit and export wafer maps in over 50 standard and custom formats |
| Material Handling Dual Arm Auto Loader | Dual purpose bare & framed on the same load port Supports Bare, Taiko, Framed, Stretched and Reconstructed wafers Bare, Taiko, Framed, Stretched and Reconstructed 4”-12” wafer size |
| Particle Removal System | Removes loose particles, eliminating nuisance calls |
| OCR | Automatic top or bottom wafer ID reading |
| Barcode Reader | Reads data matrix or barcode formats |
| Factory Automation | SECS/GEM or customized host communication; OHT/AGV ready |
| Cleanliness | Semi class 2 according to ISO-150-14644-1 |
①‒AccuracyandrepeatabilityonVLSIsteptarget